Guosen Securities Co.Ltd(002736) about
Crystal Clear Electronic Material Co.Ltd(300655) recommendation letter for gem to issue shares to specific objects through simple procedures
Sponsor (lead underwriter)
(16-26 floors of Guosen Securities Co.Ltd(002736) building, No. 1012, Hongling Middle Road, Shenzhen)
December, 2001
Sponsor statement
The recommendation institution and the two designated recommendation representatives are honest, trustworthy, diligent and responsible in accordance with the company law of the people’s Republic of China, the securities law of the people’s Republic of China and other laws and regulations and the relevant provisions of the China Securities Regulatory Commission and Shenzhen Stock Exchange, and issue this listing recommendation letter in strict accordance with the business rules and industry self-discipline norms formulated according to law, And ensure that the documents issued are true, accurate and complete.
Shenzhen Stock Exchange:
Guosen Securities Co.Ltd(002736) (hereinafter referred to as ” Guosen Securities Co.Ltd(002736) ” and “sponsor”) accepted the entrustment of Crystal Clear Electronic Material Co.Ltd(300655) (hereinafter referred to as ” Crystal Clear Electronic Material Co.Ltd(300655) “, “issuer” or “company”) to act as the sponsor of its gem to issue shares to specific objects through simple procedures. Guosen Securities Co.Ltd(002736) considered that the issuer complied with the company law of the people’s Republic of China and the securities law of the people’s Republic of China Measures for the administration of securities issuance and registration of companies listed on the gem (for Trial Implementation) (hereinafter referred to as “measures for the administration of registration”), rules for the examination and approval of securities issuance and listing of companies listed on the gem of Shenzhen Stock Exchange (hereinafter referred to as “examination rules”) and rules for the listing of shares on the gem of Shenzhen Stock Exchange (hereinafter referred to as “Listing Rules”) ）And agreed to recommend Crystal Clear Electronic Material Co.Ltd(300655) to your exchange to issue shares to specific objects through summary procedures and be listed on your gem. The relevant information is reported as follows: I. Basic information of the issuer
(i) Basic information of the issuer
Company name (Chinese): Crystal Clear Electronic Material Co.Ltd(300655)
Company name (English): crystal clear electronic material Co., Ltd
Stock abbreviation: Crystal Clear Electronic Material Co.Ltd(300655)
Stock Code: 300655
Legal representative: Wu Tianshu
Registered capital: 340635714 yuan (as of November 30, 2021, the company has not completed the industrial and commercial change procedures)
Date of establishment: November 29, 2001
Listing time: May 23, 2017
Listing place: Shenzhen Stock Exchange
Company domicile: No. 168, Shanfeng Road, Hedong Industrial Park, Wuzhong Economic Development Zone, Suzhou
Unified social credit Code: 91320500732526198b
Business scope of the company: production of ultrapure chemical materials for electronic industry (sulfuric acid, nitric acid, hydrochloric acid, hydrofluoric acid, acetic acid [content > 80%), 2-propanol, ammonium fluoride, hydrogen peroxide [20% ≤ content ≤ 60%], ammonia solution [10% < ammonia ≤ 35%]) and liquid disinfectant [peracetic acid (including tableware detergent) [content ≤ 43%, water content ≥ 5%, acetic acid ≥ 35%, hydrogen peroxide ≤ 6%, stabilizer] and hydrogen peroxide], develop and produce ultra-pure chemical materials for electronic industry and sell the products produced by the company; Engage in the wholesale business of general chemicals and hazardous chemicals (operated according to the items and methods listed in the effective hazardous chemicals business license) (not involving the commodities under the management of state-run trade, but involving the commodities under the management of quotas and licenses, apply according to the relevant provisions of the state); provide relevant technical services, consulting and technology transfer. (for projects subject to approval according to law, business activities can be carried out only with the approval of relevant departments) (the proportion of foreign capital is less than 25%)
（2） Main business
The company is a platform high-tech enterprise of Microelectronic Materials. Focusing on the two directions of Pan semiconductor materials and new energy materials, its leading products include ultra-clean and high-purity reagents, photoresists and supporting materials, lithium battery materials and basic chemical materials, which are widely used in semiconductor, lithium battery, led, flat panel display and photovoltaic Cecep Solar Energy Co.Ltd(000591) battery industries, It is specifically applied to the process links such as cleaning, lithography, development, etching and film removal in the production process of downstream electronic products.
（3） Issuer’s core technology
As of September 30, 2021, the issuer and its holding subsidiaries have a total of 85 patents, including 50 invention patents and 35 utility model patents, including 22 authorized invention patents related to photoresist, mainly a polyurethane acrylate copolymer and its photoresist combination The invention relates to an alkali soluble photosensitive resin prepared by maleic anhydride ring opening modified branched oligomer and a photoresist composition thereof, a deep UV photoresist film-forming resin prepared based on RAFT polymerization, etc.
The issuer has developed more than ten new product series, which have been applied in batches by large semiconductor customers. Among them, five products such as “new positive photoresist”, “new negative photoresist” and “photoresist stripping solution” are recognized as “high-tech products in Jiangsu Province”. Other core technologies of the company and their applications are as follows:
Sequence technical name technical level, technical level and technical advantage corresponding number source product
The invention provides an ultra-high purity isopropanol production method using resin purification method
Sequence technical name technical level, technical level and technical advantage corresponding number source product
The method uses gas as the carrier to pass isopropanol into the mixed resin exchange column designed by the method of special pure high-purity alcohol, so as to remove the cationic and anionic impurities of metal reagents in isopropanol and greatly simplify the purification process flow
It can produce ultra-high purity isopropanol on a large scale with low production energy consumption,
Low production cost.
The technology uses various purification methods to purify the hydrogen peroxide in industrial hydrogen peroxide
For the independent impurity removal of VLSI, the polishing grade ion exchange resin is mainly studied
2. Use ultra clean and high-purity hydrogen peroxide to develop the removal of trace metal ions in oxygen water and high-precision microporous filter
Removal of insoluble particles in hydrogen peroxide and ultra-high purity hydrogen peroxide
Analysis technology of oxygen and water.
This technology uses oxidant to oxidize and remove arsenic / sulfite
The technology of separating substances makes them completely removed in the distillation process;
3 VLSI independently changes and optimizes the existing hydrofluoric acid purification process and process parameters. with
When using ultra pure hydrofluoric acid technology, it is imported in order to prevent the leakage of impurities from the production equipment itself
Ultra pure purification equipment and related control system, low temperature circulating absorption technology
Technology to form batch production of ultra pure hydrofluoric acid.
The technology uses the vacuum distillation process and controls the reflux comparison tower
Clean the column; It adopts high-purity quartz glass and corrosion-resistant fluoroplastic
4. High purity self main material for semiconductor to ensure that the product is not contaminated; At the same time, it adopts precise control design,
Development of HNO3 purification technology to ensure stable pressure in the tower and kettle; Feed through pressure control tower kettle
Discharge with the finished product to make the impurity content of the product meet semi G4
Standard.
The technology develops high-purity hydrochloric acid by using low-temperature vacuum distillation technology
5. High purity hydrochloric acid technology independently follows the process of chemical dechlorination atmospheric distillation circulating filtration vacuum distillation
Development, control the pressure in the vacuum distillation kettle and strictly control the process parameters
So that the impurity content of the product meets semi G4 standard.
The formulation of water-based cleaning agent developed by this technology avoids the use of strong odor
Large benzene, ketone and other organic chemicals that do great harm to human body and environment
6. It is an independent solvent for water use in the electronic industry, and is designed to use water-based solvents such as high-efficiency and high boiling alcohol ethers
Based cleaning agent technology to develop green, odorless and environment-friendly solvent, which can effectively remove the mask at room temperature
The surface is covered with ink and colloidal dirt, which does not corrode the mask and
Auxiliary materials, cleaning agent, cleaning efficiency reaches 99.9%.
With an annual output of 5000 tons of high-purity electricity, this technology uses distillation, purification, mixed absorption and other technologies
7. The metal ion content of the independent item developed in a complete set of sub level ammonia is less than 0.1ppb, reaching semi G4 standard.
In the technical development, the ammonia concentration is controlled to be 28.0-30.0%, and the particle (≥ 0.2 μ m）≤25
PCs. / ml, single anion content ≤ 20ppb.
Autonomous i-line photoresist is the core photoresist widely used by IC manufacturers
8i line photoresist technology is developed, and the product adopts step repeated projection exposure (referred to as stepper),
0.35 can be achieved μ M resolution. Photoresist
Rzj-3600 series is mainly used in TFT panel array manufacturing.
development
Negative photoresist technology is mainly used for processing diodes, triodes and high-power devices
Sequence technical name technical level, technical level and technical advantage corresponding number source product
Development and manufacturing.
The Chinese name of CIS is cyclized polyisoprene, which is mainly used for environmental protection
11 raw material technology of negative photoresist is the raw material of negative photoresist of Suzhou Ruihong. At present, the world can
There are no more than 3 manufacturers introducing CIS synthesis technology to produce CIS on a large scale, and Suzhou Ruihong is one of them
One of.
12krf lithography technology is independent, and can meet the resolution requirements of 150nm to 250nm. At present, it has been widely used
Development enters pilot test
Positive photoresist for PSS independent rzj-325 series photoresist is mainly used for PSS for high brightness LED
13 technology development, substrate processing, replacing imports. Suzhou Ruihong promoted from 2014
It has entered the representative LED manufacturers in China.
Rzj-304 series products are mainly aimed at the application of LED market
Positive photoresist for 14led is mainly used for lithography of ITO / metal / mesa layer, with limit points
Technology development resolution 0.8 μ m. It has good adhesion to all kinds of materials, right
Both dry and wet etching processes have good adaptability.
TP positive photoresist technology independent rzj-390 series products are mainly aimed at the application of TP / LCD customers,
15 technology development is mainly used for lithography of ITO / metal layer, and the limit resolution is up to
